Model Systems Synthesis
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Controlled Functionalization of Model Catalysts
The energetic neutral atom beam lithography and epitaxy (ENABLE) capability represents a controlled method for clean and selective introduction of heteroatom dopants into a variety of substrates, including highly graphitic 2D structures, accompanied by in-situ characterization and diagnostic capabilities. Read More
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Sputter Deposition of Thin Films and High Surface Area Catalysts
Two sputter deposition chambers with the ability to deposit PGM-free catalysts by sputtering. Samples can be grown in thin film form or as conformally deposited supported nanoparticles on any vacuum stable support powder. Read More
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